JPH0545672B2 - - Google Patents

Info

Publication number
JPH0545672B2
JPH0545672B2 JP58138132A JP13813283A JPH0545672B2 JP H0545672 B2 JPH0545672 B2 JP H0545672B2 JP 58138132 A JP58138132 A JP 58138132A JP 13813283 A JP13813283 A JP 13813283A JP H0545672 B2 JPH0545672 B2 JP H0545672B2
Authority
JP
Japan
Prior art keywords
gas
electrode plate
circumferential plate
cylindrical
plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58138132A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6029470A (ja
Inventor
Takao Kawamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP58138132A priority Critical patent/JPS6029470A/ja
Publication of JPS6029470A publication Critical patent/JPS6029470A/ja
Publication of JPH0545672B2 publication Critical patent/JPH0545672B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Plasma & Fusion (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Chemical Vapour Deposition (AREA)
  • Light Receiving Elements (AREA)
JP58138132A 1983-07-27 1983-07-27 量産型グロ−放電分解装置 Granted JPS6029470A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58138132A JPS6029470A (ja) 1983-07-27 1983-07-27 量産型グロ−放電分解装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58138132A JPS6029470A (ja) 1983-07-27 1983-07-27 量産型グロ−放電分解装置

Publications (2)

Publication Number Publication Date
JPS6029470A JPS6029470A (ja) 1985-02-14
JPH0545672B2 true JPH0545672B2 (en]) 1993-07-09

Family

ID=15214730

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58138132A Granted JPS6029470A (ja) 1983-07-27 1983-07-27 量産型グロ−放電分解装置

Country Status (1)

Country Link
JP (1) JPS6029470A (en])

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62142772A (ja) * 1985-12-18 1987-06-26 Canon Inc マイクロ波プラズマcvd法による堆積膜形成装置
JPH0627331B2 (ja) * 1985-12-20 1994-04-13 キヤノン株式会社 堆積膜形成装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57185971A (en) * 1981-05-11 1982-11-16 Oki Electric Ind Co Ltd Formation of glow discharge film
JPS5889943A (ja) * 1981-11-26 1983-05-28 Canon Inc プラズマcvd法
JPS58101735A (ja) * 1981-12-11 1983-06-17 Canon Inc プラズマcvd装置
JPS6024378A (ja) * 1983-07-19 1985-02-07 Kyocera Corp 量産型グロ−放電分解装置

Also Published As

Publication number Publication date
JPS6029470A (ja) 1985-02-14

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